Preparation and characterization of highly dispersed V2O5/SiO2 prepared by a CVD method

Reaction Kinetics and Catalysis Letters

Volumn 75, Issue 2, 2002, Pages 213-224

  Kanai, Hiroyoshi ^a   Yoshikawa, Tatsuya ^b   Sone, Tadahide ^b   Nishimura, Yasuo ^b  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

CVD; Photooxidation; V2O5 SiO2; VO(OPri)3; XANES EXAFS

Indexed keywords

CATALYST ACTIVITY; CATALYST SELECTIVITY; CATALYSTS; CHEMICAL VAPOR DEPOSITION; PHOTOCHEMICAL REACTIONS; PHOTOLUMINESCENCE; PHOTOOXIDATION; PROPYLENE; SILICA; VANADIUM COMPOUNDS; VAPORIZATION; X RAY SPECTROSCOPY;

TRIPHENYLPHOSPHINE; VANDIUM OXIDE; VANDYL TRICHLORIDE;

OXIDES;

EID: 0036005669     PISSN: 01331736     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015282409268     Document Type: Article

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