Critical thickness control by deposition rate for epitaxial BaTi O3 thin films grown on SrTi O3 (001)

Journal of Applied Physics

Volumn 102, Issue 11, 2007, Pages

  Kawai, M ^a   Kan, D ^a   Isojima, S ^a   Kurata, H ^a   Isoda, S ^a   Shimakawa, Y ^a   Kimura, S ^b   Sakata, O ^b  

^a KYOTO UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; PULSED LASER DEPOSITION; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION RATE; SCANNING TRANSMISSION ELECTRON MICROSCOPY OBSERVATIONS;

THIN FILMS;

EID: 37149047492     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2821915     Document Type: Article

References (16)

1. K. J. Choi, M. Biegalski, Y. L. Li, A. Sharan, J. Schubert, R. Uecker, P. Reiche, Y. B. Chen, X. Q. Pan, V. Gopalan, L.-Q. Chen, D. G. Schlom, and C. B. Eom, Science 306, 1005 (2004).
2. D. A. Tenne, A. Bruchhausen, N. D. Lanzillotti-Kimura, A. Fainstein, R. S. Katiyar, A. Cantarero, A. Soukiassian, V. Vaithyanathan, J. H. Haeni, W. Tian, D. G. Schlom, K. J. Choi, D. M. Kim, C. B. Eom, H. P. Sun, X. Q. Pan, Y. L. Li, L. Q. Chen, Q. X. Jia, S. M. Nakhmanson, K. M. Rabe, and X. X. Xi, Science 313, 1614 (2006).
3. J. Junquera and P. Ghosez, Nature (London) 422, 506 (2003).
4. M.-W. Chu, I. Szafraniak, R. Scholz, C. Harnagea, D. Hesse, M. Alexe, and U. Gösele, Nat. Mater. 3, 87 (2004).
5. F. C. Frank and J. H. van der Merwe, Proc. R. Soc. London, Ser. A 198, 205 (1949).
6. H. Tabata, H. Tanaka, and T. Kawai, Appl. Phys. Lett. 65, 1970 (1994).
7. M. Volmer and A. Weber, Z. Phys. Chem., Stoechiom. Verwandtschaftsl. 119, 277 (1926).
8. J. W. Matthews and A. E. Blakeslee, J. Cryst. Growth 27, 118 (1974).
9. T. Suzuki, Y. Nishi, and M. Fujimoto, Philos. Mag. A 79, 2461 (1999).
10. G. H. Lee, B. C. Shin, and I. S. Kim, Mater. Lett. 50, 134 (2001).
11. H. Terauchi, Y. Watanabe, H. Kasatani, K. Kamigaki, Y. Yano, T. Terashima, and Y. Bando, J. Phys. Soc. Jpn. 61, 2194 (1992).
12. H. P. Sun, W. Tian, X. Q. Pan, J. H. Haaeni, and D. G. Schlom, Appl. Phys. Lett. 84, 3298 (2004).
13. G. Koster, B. L. Kropman, G. J. H. M. Rijnders, D. H. A. Blank, and H. Rogalla, Appl. Phys. Lett. 73, 2920 (1998).
14. M. Kawasaki, K. Takahashi, T. Maeda, R. Tsuchiya, M. Shinohara, O. Ishiyama, T. Yonezawa, M. Yoshimoto, and H. Koinuma, Science 266, 1504 (1994).
15. E. J. Kirkland, R. F. Loane, and J. Silcox, Ultramicroscopy 23, 77 (1987).
16. N. Grandjean, J. Massies, M. Leroux, J. Leymarie, A. Vasson, and M. Vasson, Appl. Phys. Lett. 64, 2664 (1994).