Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2526-2530

  Clarke, James S ^a   Schmidt, Michael B ^b   Orji, Ndubuisi G ^c  

^a INTEL CORPORATION   (United States)

^b Thermo Fisher Scientific   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM SPUTTERING; HIGH ENERGY ION DECOMPOSITION; PROFILE IMAGING; REFERENCE MEASUREMENT SYSTEM (RMS);

ATOMIC FORCE MICROSCOPY; CHROMIUM; FOCUSED ION BEAMS; SCANNING ELECTRON MICROSCOPY;

PHOTORESISTS;

EID: 37149038885     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804516     Document Type: Article

References (7)

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