An initial investigation into the use of focused ion beam technology for inline process control of critical dimensions in the FAB

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Volumn , Issue , 2005, Pages 394-397

  Franco, Giovanni ^a   DeSouza, Zubin ^b   Mello, Domenico ^a   Weschler, Matt ^b  

^a STMICROELECTRONICS   (Italy)

^b Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA ACQUISITION; FEEDBACK; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

FOCUSED ION BEAM (FIB); PROCESS STEPS;

ION BEAMS;

EID: 28744459107     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/issm.2005.1513387     Document Type: Conference Paper

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