Combined ab-initio and N-K, Ti-L2,3, V-L2,3 electron energy-loss near edge structure studies for TiN and VN films

International Journal of Materials Research

Volumn 98, Issue 11, 2007, Pages 1060-1065

  Rashkova, Boriana ^a   Lazar, Petr ^b   Redinger, Josef ^b   Podloucky, Raimund ^c   Kothleitner, Gerald ^d   Šturm, Sašo ^e   Kutschej, Kerstin ^a   Mitterer, Christian ^a   Scheu, Christina ^a   Dehm, Gerhard ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^c UNIVERSITY OF VIENNA   (Austria)

^d GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^e JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Ab initio calculations; EELS; ELNES; TiN VN films

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; MONOCHROMATORS; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY;

AB-INITIO CALCULATIONS; ATOMIC RATIOS; STOICHIOMETRIC PHASES;

TITANIUM COMPOUNDS;

EID: 37149014721     PISSN: 18625282     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.101568     Document Type: Article

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