Effect of substrate temperature on the properties of TiO2 composite films deposited by atmospheric pressure chemical vapor deposition

Kuei Suan Jen Hsueh Pao/ Journal of the Chinese Ceramic Society

Volumn 35, Issue 11, 2007, Pages 1520-1525

  Lin, Mingxian ^a   Zhao, Gaoling ^a   Wang, Jianxun ^a   Weng, Wenjian ^a   Liu, Junbo ^b   Ying, Yiming ^b   Han, Gaorong ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b Hangzhou Bluestar New Material Technical Co Ltd   (China)

Author keywords

Atmospheric pressure chemical vapor deposition; Energy saving; Fluorin doped tin dioxide; Photocatalysis; Titanium dioxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; COMPOSITE FILMS; DOPING (ADDITIVES); ENERGY CONVERSION; FLUORINE; GLASS; PHOTOCATALYSIS; TIN OXIDES; TITANIUM DIOXIDE;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ENERGY SAVING; FLUORINE DOPED TIN DIOXIDE; NEEDLE LIKE STRUCTURE; PHOTOCATALYTIC PROPERTIES; SUBSTRATE TEMPERATURE;

TEMPERATURE;

EID: 37149002921     PISSN: 04545648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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