Preparation and microstructural characterization of nanosized Mo-TiO 2 and Mo-W-O thin films by sputtering: Tailoring of composition and porosity by thermal treatment

Materials Science and Engineering: B

Volumn 101, Issue 1-3, 2003, Pages 216-221

  Vomiero, A ^a,b   Della Mea, G ^a,b   Ferroni, M ^c   Martinelli, G ^c   Roncarati, G ^c   Guidi, V ^c,d   Comini, E ^e   Sberveglieri, G ^e  

^a UNIVERSITY OF TRENTO   (Italy)

^b LABORATORI NAZIONALI DI LEGNARO   (Italy)

^c UNIVERSITY OF FERRARA   (Italy)

^d INFN SEZIONE DI FERRARA   (Italy)

^e INFM   (Italy)

Author keywords

Gas sensing; MoO3; Sputtering; Thin films; TiO2; WO3

Indexed keywords

ANNEALING; CHEMICAL SENSORS; ELECTRON DIFFRACTION; FILM GROWTH; MAGNETRON SPUTTERING; MICROSTRUCTURE; MOLYBDENUM; MORPHOLOGY; NANOSTRUCTURED MATERIALS; POROSITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR DOPING; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY;

GAS SENSING; MOO3; TIO2; WO3;

THIN FILMS;

EID: 1642311103     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00666-9     Document Type: Conference Paper

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