Synthesis-structure relations for reactive magnetron sputtered V2O5 films

Surface and Coatings Technology

Volumn 202, Issue 8, 2008, Pages 1551-1555

  Fateh, N ^a   Fontalvo, G A ^a   Cha, L ^a   Klunsner T ^a   Hlawacek, G ^a   Teichert, C ^a   Mitterer, C ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Atomic force microscopy (AFM); Raman spectroscopy; Thin films; Transmission electron microscopy (TEM); V2O5

Indexed keywords

AMORPHOUS FILMS; CRYSTAL SYMMETRY; FILM GROWTH; MAGNETRON SPUTTERING; POLYCRYSTALS; REACTIVE SPUTTERING; SURFACE MORPHOLOGY;

ORTHORHOMBIC SYMMETRY;

VANADIUM COMPOUNDS;

AMORPHOUS FILMS; CRYSTAL SYMMETRY; FILM GROWTH; MAGNETRON SPUTTERING; POLYCRYSTALS; REACTIVE SPUTTERING; SURFACE MORPHOLOGY; VANADIUM COMPOUNDS;

EID: 37049024146     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.07.010     Document Type: Article

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