Selective dissolution of Agx(As0.33S0.67-ySey)100-x chalcogenide thin films

Journal of Non-Crystalline Solids

Volumn 354, Issue 2-9, 2008, Pages 533-539

  Orava, J ^a   Wagner, T ^a   Krbal, M ^a   Kohoutek, T ^a   Vlcek, Mil ^a   Klapetek, P ^b   Frumar, M ^a  

^a UNIVERSITY OF PARDUBICE   (Czech Republic)

^b CZECH METROLOGY INSTITUTE   (Czech Republic)

Author keywords

Atomic force and scanning tunneling microscopy; Chalcogenides; Chemical durability; Composition; Vapor phase deposition

Indexed keywords

AMINES; CHALCOGENIDES; DISSOLUTION; ETCHING; MICROLENSES; THERMAL EVAPORATION;

AMINOETHANOL; CHEMICAL DURABILITY; VACUUM THERMAL EVAPORATION; VAPOR PHASE DEPOSITION;

THIN FILMS;

EID: 36849094381     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.07.058     Document Type: Article

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