Backward rectifying and forward Schottky behavior at Au/Nb-1.0 wt % -doped SrTiO3 interface

Applied Physics Letters

Volumn 91, Issue 23, 2007, Pages

  Cui, Yimin ^a   Wang, Rongming ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE MEASUREMENT; CURRENT VOLTAGE CHARACTERISTICS; GOLD; LEAKAGE CURRENTS; NIOBIUM COMPOUNDS; SPUTTERING;

HIGH TEMPERATURE ANNEALING; INTERFACE BARRIERS; MAGNETIC CONTROLLED SPUTTERING; SCHOTTKY JUNCTIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 36849044046     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2823583     Document Type: Article

References (20)

1. H. P. R. Frederikse, W. R. Thurber, and W. R. Hosler, Phys. Rev. 134, A442 (1964).
2. T. Tomio, H. Miki, H. Tabata, T. Kawai, and S. Kawai, J. Appl. Phys. 76, 5886 (1994).
3. K. Fukushima and S. Shibagaki, Thin Solid Films, 315, 238 (1998).
4. T. Zhao, H. Lu, F. Fan, S. Dai, G. Yang, and Z. Chen, J. Cryst. Growth 212, 451 (2000).
5. Z. Sroubek, Phys. Rev. B 2, 3170 (1970).
6. G. Binnig, A. Baratoff, H. E. Hoenig, and J. G. Bednorz, Phys. Rev. Lett. 45, 1352 (1980).
7. Y. Watanabe, Phys. Rev. B 57, R5563 (1998).
8. D. M. Newns, J. A. Misewich, C. C. Tsuei, A. Gupta, B. A. Scott, and A. Schrott, Appl. Phys. Lett. 73, 780 (1998).
9. H. Hasegawa and T. Nishino, J. Appl. Phys. 69, 1501 (1991).
10. Y. Haruyama, Y. Aiura, H. Bando, H. Suzuki, and Y. Nishihara, Physica B 237, 380 (1997).
11. T. Shimizu, N. Gotoh, N. Shinozaki, and H. Okushi, Appl. Surf. Sci. 117/118, 400 (1997).
12. T. Shimizua and H. Okushi, Appl. Phys. Lett. 67, 1411 (1995).
13. H. Tanaka, J. Zhang, and T. Kawai, Phys. Rev. Lett. 88, 027204 (2002).
14. J. Zhang, H. Tanaka, and T. Kawai, Appl. Phys. Lett. 80, 4378 (2002).
15. Y. M. Cui, L. W. Zhang, C. C. Wang, and G. L. Xie, Appl. Phys. Lett. 86, 203501 (2005).
16. T. Kawada, T. Ichikawa, L. Q. Han, K. Yashiro, H. Matsumoto, and J. Mizusaki, J. Electroceram. 13, 715 (2004).
17. T. Kawada, N. Iizawa, M. Tomida, A. Kaimai, K. Kawamura, Y. Nigara, and J. Mizusaki, J. Eur. Ceram. Soc. 19, 687 (1999).
18. J. F. Schooley, W. R. Hosler, E. Ambler, and J. H. Becker, Phys. Rev. Lett. 14, 305 (1965).
19. H. C. Card and E. H. Rhoderick, J. Phys. D 4, 1602 (1971).
20. C. M. Wang, V. Shutthanandan, Y. Zhang, and S. Thevuthasan, Phys. Rev. B 70, 172201 (2004).