Developments in hot-filament metal oxide deposition (HFMOD)

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 789-793

  Durrant, Steven F ^a   Trasferetti, Benedito C ^b   Scarmínio, Jair ^c   Davanzo, Celso U ^d   Rouxinol, Francisco P M ^d   Gelamo, Rogério V ^d   Bica de Moraes, Mario A ^d  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b Superintendência Regional no Piauí   (Brazil)

^c STATE UNIVERSITY OF LONDRINA   (Brazil)

^d UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Electrochromism; Hot wire CVD; Molybdenum oxide; Thin films; Tungsten oxide; Vanadium oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTROCHROMISM; OXIDATION; OXYGEN; STOICHIOMETRY; THIN FILMS; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILAMENT MATERIALS; FILM DEPOSITION; HOT FILAMENT METAL OXIDE DEPOSITION (HFMOD;

TUNGSTEN COMPOUNDS;

EID: 36849007550     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.183     Document Type: Article

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