Tungsten oxide films of high electrochromic efficiencies Obtained by deposition

Electrochemical and Solid-State Letters

Volumn 6, Issue 6, 2003, Pages

  Scarminio, Jair ^a   Bica De Moraes, Mário A ^b   Dias, Rafael C E ^a   Rouxinol, Francisco P ^b   Durrant, Steven F ^c  

^a STATE UNIVERSITY OF LONDRINA   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

^c INSTITUTO DE PESQUISA E DESENVOLVIMENTO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTROCHROMISM; LITHIUM; MOLECULAR STRUCTURE; OXYGEN; PRESSURE EFFECTS; STOICHIOMETRY; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILAMENT TEMPERATURE; HIGH ELECTROCHROMIC EFFICIENCY; OXYGEN PRESSURE; TUNGSTEN OXIDE FILM;

TUNGSTEN COMPOUNDS;

EID: 0037799485     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1570632     Document Type: Article

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