Protection of organic light-emitting diodes over 50 000 hours by Cat-CVD SiNx/SiOxNy stacked thin films

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 611-614

  Ogawa, Yohei ^a   Ohdaira, Keisuke ^a   Oyaidu, Takuya ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical vapor deposition; Moisture; Organic light emitting diode; Passivation; Silicon nitride; Silicon oxynitride; Water vapor transmission rate

Indexed keywords

CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; ORGANIC LIGHT EMITTING DIODES (OLED); PASSIVATION; SILICON NITRIDE; WATER VAPOR;

CATALYTIC CHEMICAL VAPOR DEPOSITION; SILICON OXYNITRIDE; WATER VAPOR TRANSMISSION RATE;

THIN FILMS;

EID: 36749049758     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.218     Document Type: Article

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