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Volumn 43, Issue 1, 2008, Pages 312-315
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The effect of annealing temperature on the properties of ZnO films with preferential nonpolar plane orientation by SSCVD
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
OPTICAL PROPERTIES;
THERMAL EFFECTS;
X RAY DIFFRACTION;
ZINC OXIDE;
DEEP LEVEL EMISSION (DLE);
SINGLE SOURCE CHEMICAL VAPOR DEPOSITION (SSCVD);
OXIDE FILMS;
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EID: 36749022653
PISSN: 00222461
EISSN: 15734803
Source Type: Journal
DOI: 10.1007/s10853-007-2058-z Document Type: Article |
Times cited : (8)
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References (18)
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