Effect of temperature on the morphology and kinetics of surface pattern formation in thin block copolymer films

Langmuir

Volumn 23, Issue 24, 2007, Pages 12380-12387

  Smith, Archie P ^a,b   Douglas, Jack F ^a   Amis, Eric J ^a   Karim, Alamgir ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Technology Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIBLOCK COPOLYMER FILMS; PATTERN FORMATION;

BLOCK COPOLYMERS; FILM GROWTH; FILM THICKNESS; SURFACE MORPHOLOGY; THERMAL EFFECTS;

POLYMER FILMS;

NANOMATERIAL; POLY(METHYL METHACRYLATE); SILICON; SURFACTANT;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CONFOCAL MICROSCOPY; ELASTICITY; KINETICS; PARTICLE SIZE; SURFACE PROPERTY; TEMPERATURE; ULTRASTRUCTURE;

ELASTICITY; KINETICS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, CONFOCAL; NANOSTRUCTURES; PARTICLE SIZE; POLYMETHYL METHACRYLATE; SILICON; SURFACE PROPERTIES; SURFACE-ACTIVE AGENTS; TEMPERATURE;

EID: 36649035709     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la701084x     Document Type: Article

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