Combinatorial study of surface pattern formation in thin block copolymer films

Physical Review Letters

Volumn 87, Issue 1, 2001, Pages

  Smith, Archie P ^a   Douglas, Jack F ^a   Meredith, J Carson ^a,b   Amis, Eric J ^a   Karim, Alamgir ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; LIGHT INTERFERENCE; MATHEMATICAL MODELS; MORPHOLOGY; OPTICAL MICROSCOPY; PHASE SEPARATION; PHASE TRANSITIONS; POLYMETHYL METHACRYLATES; SURFACES;

DIBLOCK COPOLYMER FILMS; MOLECULAR MASS; SURFACE CHAIN DENSITY; SURFACE PATTERN FORMATION;

THIN FILMS;

EID: 30444437687     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.87.015503     Document Type: Article

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