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Journal of Polymer Science, Part B: Polymer Physics

Volumn 39, Issue 18, 2001, Pages 2141-2158

High-throughput characterization of pattern formation in symmetric diblock copolymer films

(5) Smith, Archie P a Douglas, Jack F a Meredith, J Carson a,b Amis, Eric J a Karim, Alamgir a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b Georgia Institute of Technology (United States)

Author keywords

Block copolymer; Combinatorial measurements; Surface pattern; Thin film

Indexed keywords

ANNEALING; MECHANICAL PROPERTIES; MOLECULAR STRUCTURE; SURFACE MEASUREMENT; SURFACE ROUGHNESS; SURFACE STRUCTURE; THICKNESS MEASUREMENT; THIN FILMS;

COMBINATORIAL MEASUREMENTS; PATTERN FORMATION; SYMMETRIC DIBLOCK COPOLYMERS;

BLOCK COPOLYMERS;

EID: 0035908923 PISSN: 08876266 EISSN: None Source Type: Journal
DOI: 10.1002/polb.1188 Document Type: Article

Times cited : (89)

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