Investigation of the e × B rotation of electrons and related plasma characteristics in a radio frequency magnetron sputtering discharge

Journal of Physics D: Applied Physics

Volumn 40, Issue 22, 2007, Pages 6865-6872

  Kakati, H ^a   Pal, A R ^a   Bailung, H ^a   Chutia, Joyanti ^a  

^a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ELECTRIC DISCHARGES; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE;

ELECTRON DRIFT VELOCITY; PLANAR MAGNETRON SPUTTERING DISCHARGE; PLASMA CHARACTERISTICS; RACETRACK REGION; SHEATH STRUCTURE;

ELECTRODYNAMICS;

EID: 36448977667     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/22/002     Document Type: Article

References (25)

1. Nowicki R S 1977 J. Vac. Sci. Technol. 14 127
2. Waits R K 1978 J. Vac. Sci. Technol. 15 179
3. Deshpandey C and Holland L 1982 Thin Solid Films 96 265
4. Vuoristo P, Mantyla T and Ketfunen P 1991 Thin Solid Films 204 297
5. Kulikovsky V Yu 1997 Surf. Coat. Technol. 94 428
6. Thornton J A 1978 J. Vac. Sci. Technol. 15 171
7. Windows B and Savides N 1986 J. Vac. Sci. Technol. A 4 196
8. Grill A 1993 Cold Plasma in Materials Fabrication (New York: IEEE)
9. Minea T M, Bretagne J, Pagnon D and Touzeau M 2000 J. Phys. D: Appl. Phys. 33 1884
10. Riemann K U 1992 Phys. Fluids B 4 2693
11. Kakati H, Pal A R, Bailung H and Chutia J 2006 J. Appl. Phys. 100 083303
12. Sheridian T E, Goelkner M J and Goree J 1990 J. Vac. Sci. Technol. A 8 30
13. Sheridian T E, Goeckner M J and Goree J 1998 J. Vac. Sci. Technol. A 16 2173
14. Bradley J W, Thompson S and Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490
15. Rossnagel S M and Kaufman H R 1987 J. Vac. Sci. Technol. A 5 88
16. Rossnagel S M and Kaufman H R 1987 J. Vac. Sci. Technol. A 5 2276
17. Fujita H, Yagura S, Ueno H and Nagano M 1986 J. Phys. D: Appl. Phys. 19 1699
18. Paranjpe A P, McVittie J P and Self S A 1990 J. Appl. Phys. 67 6718
19. Chatterton P A, Rees J A, Wu W L and Al-Assadi K 1991 Vacuum 42 489
20. Jeon S J, Eom G S, Kim J H and Choe W 2002 Rev. Sci. Instrum. 73 277
21. Kemp R F and Sellen J M Jr 1966 Rev. Sci. Instrum. 37 455
22. Oksuz L and Hershkowitz N 2004 Plasma Sources Sci. Technol. 13 263
23. Murgatroyd P N, Chu A K Y, Richardson G K, West D, Yearley G A and Spencer A J 1991 Meas. Sci. Technol. 2 1218
24. Pal A R, Chutia J and Bailung H 2004 Phys. Plasmas 11 4719
25. Boruah D, Pal A R, Bailung H and Chutia J 2003 J. Phys. D: Appl. Phys. 36 645