Run-to-run control and state estimation in high-mix semiconductor manufacturing

Annual Reviews in Control

Volumn 31, Issue 2, 2007, Pages 241-253

  Bode, C A ^a   Wang, J ^b   He, Q P ^c   Edgar, T F ^d  

^a ADVANCED MICRO DEVICES   (United States)

^b AUBURN UNIVERSITY   (United States)

^c TUSKEGEE UNIVERSITY   (United States)

^d The University of Texas at Austin   (United States)

Author keywords

Control threads; Manufacturing; Recursive least squares; Run to run control; Semiconductor; State estimation

Indexed keywords

DATA REDUCTION; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

CONTROL THREADS; RECURSIVE LEAST SQUARES;

STATE ESTIMATION;

EID: 36349027946     PISSN: 13675788     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.arcontrol.2007.07.001     Document Type: Article

References (18)

1. Bode, C. A. (2001). Run-to-run control of overlay and linewidth in semiconductor manufacturing, Ph.D. dissertation, University of Texas, Austin, TX.
2. Braun M.W., Jenkins S.T., and Patel N.S. A comparison of supervisory control algorithms for tool/process disturbance tracking. Proceedings of the American Control Conference (2003) 2626-2631
3. Edgar T.F., Butler S.W., Campbell W.J., Pfeiffer C., Bode C., Hwang S.B., Balakrishnan K.S., and Hahn J. Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities. Automatica 36 11 (2000) 1567-1603
4. Firth S.K., Campbell W.J., Toprac A., and Edgar T.F. Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes. IEEE Transactions on Semiconductor Manufacturing 19 3 (2006) 298-315
5. Hanish C.K. Run-to-run state estimation in systems with unobservable states. Proceedings of the AEC/APC Symposium XVII (2005), Indian Wells, CA
6. Jang S.S., and Wong D.S.H. Stability and performance analysis of mixed product run-to-run control. Proceedings of the AEC/APC Symposium XVII (2005), Indian Wells, CA
7. Levinson H.J. Principles of lithography (2001), SPIE Press, Bellingham, WA
8. Lewis F.L. Optimal estimation (1986), John Wiley and Sons, NY
9. Miller M.L. Impact of multi-product and process manufacturing on run-to-run control. In: Ghanbari A., and Toprac A. (Eds). Process, equipment and materials control in integrated circuit manufacturing III (1997), SPIE
10. In: Moyne J., Del Castillo E., and Hurwitz A.M. (Eds). Run-to-run control in semiconductor manufacturing (2001), CRC press, Boca Raton, FL
11. Pasadyn A.J., and Edgar T.F. Observability and state estimation for multiple product control in semiconductor manufacturing. IEEE Transactions on Semiconductor Manufacturing 18 4 (2005) 592-604
12. Patel N.S., Miller A., Guinn C., Sanchez A.C., and Jenkins S.T. Device dependent control of chemical-mechanical polishing of dielectric films. IEEE Transactions on Semiconductor Manufacturing 13 3 (2000) 331-343
13. Salgado M.E., Goodwin G.C., and Middleton R.H. Modified least squares algorithm incorporating exponential resetting and forgetting. International Journal of Control 47 2 (1988) 477-491
14. Schmitz J. A view on advanced control techniques from a wafer fab manager's perspective. 3rd European AEC/APC Conference (2002), Dresden, Germany
15. Seborg D.E., Edgar T.F., and Mellichamp D.A. Process dynamics and control. 2nd ed. (2004), Wiley, New York
16. Stefani J., and Butler S.W. Application of predictor corrector control to polysilicon gate etching. Proceedings of the American Control Conference (1993) 3003-3007
17. Stuber J.D., Pagette F., and Tang S. Device dependent run-to-run control of transistor critical dimension by manipulating photolithography exposure settings AEC/APC Symposium XII (2000), Lake Tahoe, CA
18. Wang, J., He, Q. P., & Edgar, T. F. (in press). On state estimation in high-mix semiconductor manufacturing using a singular Gauss-Markov model. IEEE Transactions on Semiconductor Manufacturing.