Using different carrier gases to control AlN film stress and the effect on morphology, structural properties and optical properties

Journal of Physics D: Applied Physics

Volumn 40, Issue 23, 2007, Pages 7462-7466

  Hu, W G ^a   Liu, X L ^a   Jiao, C M ^a   Wei, H Y ^a   Kang, T T ^a   Zhang, P F ^a   Zhang, R Q ^a   Fan, H B ^a   Zhu, Q S ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; COMPRESSIVE STRESS; MORPHOLOGY; OPTICAL PROPERTIES; RELAXATION PROCESSES; STRUCTURAL PROPERTIES; TENSILE STRESS;

CARRIER GASES; FILM STRESS; IN-PLANE STRESS; RELAXATION STATE;

METALLIC FILMS;

EID: 36349020229     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/23/030     Document Type: Article

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