Deposition of plasma-polymerized 1-cyanoisoquinoline thin films and their dielectric properties

Plasma Processes and Polymers

Volumn 4, Issue 9, 2007, Pages 840-846

  Zhao, Xiong Yan ^a   Wang, Ming Zhu ^a   Wang, Zhi ^b  

^a HEBEI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b AGRICULTURAL UNIVERSITY OF HEBEI   (China)

Author keywords

1 cyanoisoquinoline; Dielectric properties; Low K dielectrics; Plasma deposition; Plasma polymerization

Indexed keywords

DIELECTRIC PROPERTIES OF SOLIDS; GLOW DISCHARGES; MORPHOLOGY; PLASMA DEPOSITION; PLASMA POLYMERIZATION; STRUCTURE (COMPOSITION); SURFACE STRUCTURE; THIN FILMS;

AROMATIC RING STRUCTURE; DISCHARGE POWER; PLASMA FILMS;

POLYMER FILMS;

EID: 36348985491     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200700063     Document Type: Article

References (38)

1. M. C. Kim, S. H. Cho, S. B. Lee, Y. Kim, J. H. Boo, Thin Solid Films 2004, 592, 447.
2. "Plasma Chemistry", L. S. Polak, Yu. A. Lebedev, Eds., Cambridge International Science Publishing, UK 1998.
3. G. D. Fu, E. T. Kang, K. G. Neoh, J. Phys. Chem. B 2003, 107, 13902.
4. L. Sandrin, M. S. Silverstein, E. Sacher, Polymer 2001, 42, 3761.
5. S. R. Coulson, I. S. Woodward, J. P. S. Badyal, S. A. Brewer, C. Willis, Langmuir 2000, 16, 6278.
6. L. Guo, J. H. Lee, G. Beaucage, J. Non-Cryst. Solids 1999, 243, 61.
7. J. K. Hong, H. S. Yang, M. H. Jo, H. H. Park, S. Y. Choi, Thin Solid Films 1997, 308, 495.
8. R. Q. Su, T. E. Muller, J. Prochazka, J. A. Lercher, Adv. Mater. 2002, 14, 1369.
9. H. C. Kim, J. B. Wilds, C. R. Kreller, W. Volksen, P. J. Brock, V. Y. Lee, T. Magbitang, J. L. Hedrick, C. J. Hawker, R. D. Miller, Adv. Mater. 2002, 14, 1637.
10. G. Maier, Prog. Polym. Sci. 2001, 26, 3.
11. Y. J. Lee, J. M. Huang, S. W. Kuo, J. S. Lu, F. C. Chang, Polymer 2005, 46, 173.
12. J. L. Hedrick, J. W. Labadie, T. P. Russell, D. Hofer, V. Wakharkar, Polymer 1993, 34, 4717.
13. Y. Xu, Y. Tsai, K. N. Tu, B. Zhao, Q. Liu, M. Brongo, G. T. T. Sheng, C. H. Tung, Appl. Phys. Lett. 1999, 75, 853.
14. M. D. Houtz, J. M. Lavoie, D. L. Pedrick, E. G. Jones, M. R. Unroe, L. S. Tan, Polym. Prepr. 1994, 35, 437.
15. W. D. Joseph, J. C. Abed, T. H. Yoon, J. E. McGrath, Polym. Prepr. 1994, 35, 551.
16. Proc. 6th Int. Conf. Polyimides and other Low-k Dielectrics, N. Grove, S. A. Bidstrup, P. A. Kohl, R. A. Shick, L. H. McIntosh, S. Jayaraman, Eds., McAfee, NJ 1997.
17. N. R. Grove, P. A. Kohl, S. A. Bidstrup-Allen, R. A. Shick, B. L. Goodall, S. Jayaraman, Mater. Res. Soc. Symp. Proc. 1997, 476, 3.
18. O. Nuyken, M. B. Leitner, G. Maier, Makromol. Chem. 1991, 192, 3071.
19. J. V. Crivello, Mater. Res. Soc. Symp. Proc. 1995, 381, 51.
20. P. D. Sybert, W. H. Beever, J. K. Stille, Macromolecules 1981, 14, 493.
21. H. Treichel, B. Withers, G. Ruhl, P. Ansmann, R. Wurl, C. H. Muller, M. Dietlmeier, G. Maier, "Low-k and high-k materials", H. S. Nalwa, Ed., Academic Press, Oxford 1999.
22. X. Y. Zhao, M. Z. Wang, B. Z. Zhang, L. Mao, Polym. Int. 2007, 56, 630.
23. X. Y. Zhao, M. Z. Wang, J. Xiao, Eur. Polym. J. 2006, 42, 2161.
24. H. Y. Kim, H. K. Yasuda, J. Vac. Sci. Technol. 1997, A15, 1837.
25. "Plasma Deposition, Treatment and Etching of Polymers", R. d'Agostino, Ed., Academic Press, Boston 1990.
26. G. H. Yang, Y. Zhang, E. T. Kang, K. G. Neoh, A. C. H. Huan, D. M. Y. Lai, J. Mater. Chem. 2002, 12, 426.
27. P. Singer, Semicond Int. 1996, 19, 88.
28. L. Sabdrin, M. S. Silverstein, E. Sacher, Polymer 2001, 42, 3761.
29. R. Chen, M. S. Silverstein, J. Polym. Sci., A: Polym. Chem. 1996, 34, 207.
30. L. Sabdrin, M. S. Silverstein, E. Sacher, Polymer 2001, 42, 3761.
31. M. S. Silverstein, I. Visoly-Fisher, Polymer 2002, 43, 11.
32. G. Beamson, D. Briggs, "High Resolution XPS of Organic Polymers", Wiley, New York 1992.
33. N. Inagki, S. Tasaka, Y. Ikeda, J. Appl. Polym. Sci. 1995, 55, 1451.
34. J. E. Huheey, "Inorganic Chemistry", Harper and Row, New York 1978.
35. A. Goswami, A. P. Goswami, Thin Solid Films 1973, 16, 175.
36. S. Jayalekshmi, M. G. K. Pillai, Thin Solid Films 1984, 122, 197.
37. D. Sakthi Kumar, Y. Yoshida, Surf. Coat. Technol. 2003, 169-170, 600.
38. X. Y. Zhao, X. Hu, Y. K. He, H. Y. Chen, J. Mater. Sci. 2001, 12, 557.