Growth stresses in α -Cr2 O3 thermal oxide films determined by in situ high temperature Raman spectroscopy

Journal of Applied Physics

Volumn 102, Issue 9, 2007, Pages

  Kemdehoundja, M ^a   Grosseau Poussard, J L ^a   Dinhut, J F ^a   Panicaud, B ^b  

^a UNIVERSITÉ DE LA ROCHELLE   (France)

^b UNIVERSITÉ DE TECHNOLOGIE DE TROYES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; GROWTH (MATERIALS); MICROSTRUCTURE; OXIDATION; RAMAN SPECTROSCOPY; THERMAL EFFECTS;

EQUIBIAXIAL GROWTH STRESSES; GROWTH STRESSES; TEMPERATURE OXIDATION;

OXIDE FILMS;

EID: 36249026149     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2805638     Document Type: Article

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