Crystallization kinetics and recording mechanism of a-SiNi bilayer for write-once blue-ray recording

Journal of Applied Physics

Volumn 102, Issue 9, 2007, Pages

  Her, Yung Chiun ^a   Jean, Sen Tsun ^a   Wu, Jyun Lin ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION KINETICS; LASER BEAM EFFECTS; LASER PULSES; NICKEL; NUCLEATION;

CRYSTALLIZATION TEMPERATURE; RECORDING MECHANISM; THERMAL ANNEALING; THICKNESS RATIO;

SILICON;

EID: 36248965605     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2802992     Document Type: Article

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