Discharge produced plasma source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6611, Issue , 2007, Pages

  Borisov, V ^a   Eltzov, A ^a   Ivanov, A ^a   Khristoforov, O ^a   Kirykhin, Yu ^a   Vinokhodov, A ^a   Vodchits, V ^a   Mishhenko, V ^a   Prokofiev, A ^a  

^a TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

Discharge produced plasma; EUV source; Excimer laser; Lithography; Rotating disk electrode

Indexed keywords

LITHOGRAPHY; MICROPROCESSOR CHIPS; SEMICONDUCTOR DEVICE MANUFACTURE;

DISCHARGE PRODUCED PLASMAS; EUV SOURCE; ROTATING DISK ELECTRODES;

EXCIMER LASERS;

EID: 36248961180     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.740590     Document Type: Conference Paper

References (5)

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