Control of resist heating effect

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 256-265

  Anze, Hirohito ^a   Abe, Takayuki ^a   Sakurai, Hideaki ^a   Iijima, Tomohiro ^a   Hattori, Yoshiaki ^a   Nakayamada, Noriaki ^a   Kamikubo, Takashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONTROLLABILITY; ELECTRON BEAM LITHOGRAPHY; MASKS; MATHEMATICAL MODELS;

CRITICAL DIMENSION (CD); ELECTRON BEAM WRITING SYSTEM;

PHOTORESISTS;

EID: 0033697553     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)