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Volumn 401-402, Issue , 2007, Pages 163-166

Theoretical study of the CiOi and IsiCiOi defects in Si

Author keywords

C4 defect; Carbon; Oxygen; Self interstitial; Silicon; Theory

Indexed keywords

BINDING ENERGY; CHARGE TRAPPING; DEFECT STRUCTURES; INFRARED ABSORPTION; SILICON; VIBRATIONAL SPECTRA;

EID: 36148958980     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2007.08.137     Document Type: Article
Times cited : (15)

References (41)
  • 2
    • 36148935428 scopus 로고    scopus 로고
    • F. Shimura, (Ed.), Oxygen in silicon, in: Semiconductors and Semimetals, vol. 42, Academic, Boston, 1994.
  • 13
    • 36148950815 scopus 로고    scopus 로고
    • L.C. Kimerling, P. Blood, W.M. Gibson, in: Defects and Radiation Damage in Semiconductors, 1978 (IOP Conf. Ser. 46, 273 (1979)).
  • 26
    • 36148938193 scopus 로고    scopus 로고
    • V.P. Markevitch, private communication.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.