Experimental studies on epitaxially grown TiN and VN films

Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 369-373

  Kutschej, K ^a   Rashkova, B ^a   Shen, J ^a   Edwards, D ^a   Mitterer, C ^a   Dehm, G ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

Author keywords

EBSD; Epitaxial growth; Hardness; TEM; TiN; VN

Indexed keywords

BACKSCATTERING; COATINGS; DIFFRACTION; DIFFUSION; EPITAXIAL GROWTH; HARDNESS; LATTICE MISMATCH; MAGNETRON SPUTTERING; MICROSTRUCTURE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

COATING SURFACES; DISLOCATION DENSITY; ELECTRON BACK-SCATTER DIFFRACTION;

METALLIC FILMS;

EID: 36049042572     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.104     Document Type: Article

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