Electrochromic WO3 thin films active in the IR region

Solar Energy Materials and Solar Cells

Volumn 92, Issue 2, 2008, Pages 209-215

  Sauvet, K ^a,b   Rougier, A ^a   Sauques, L ^b  

^a CNRS RS2E FR 3459   (France)

^b Delegation Generale pour l'Armement   (France)

Author keywords

Electrochromism; Middle infrared; Pulsed laser deposition; RF sputtering; WO3 thin films

Indexed keywords

ELECTROCHROMISM; INFRARED RADIATION; OPTIMIZATION; PULSED LASER DEPOSITION; RADIOFREQUENCY SPECTROSCOPY; THERMAL EFFECTS; TUNGSTEN COMPOUNDS; WAVELENGTH;

IR REGION; MIDDLE INFRARED; RF-SPUTTERING; ROOM TEMPERATURE;

THIN FILMS;

EID: 36048979958     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2007.01.025     Document Type: Article

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