Sputter alloying of Ni, Ti and Hf for fabrication of high temperature shape memory thin films

Materials Science and Technology

Volumn 23, Issue 8, 2007, Pages 987-991

  Sanjabi, S ^a   Sadmezhaad, S K ^b   Barber, Z H ^c  

^a TARBIAT MODARES UNIVERSITY   (Iran)

^b SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

^c UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

DC magnetron; High temperature shape memory; Ni Tl Hf; Separate targets; Thin film

Indexed keywords

ANNEALING; CRYSTALLIZATION KINETICS; DIFFERENTIAL SCANNING CALORIMETRY; ENERGY DISPERSIVE X RAY ANALYSIS; MAGNETRON SPUTTERING; SHAPE MEMORY EFFECT;

FILM COMPOSITION; HIGH TEMPERATURE SHAPE MEMORY; TRANSFORMATION TEMPERATURE;

THIN FILMS;

EID: 36048952061     PISSN: 02670836     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708306X81469     Document Type: Article

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