Variety of iron silicides grown on Si(0 0 1) surfaces by solid phase epitaxy: Schematic phase diagram

Surface Science

Volumn 601, Issue 22, 2007, Pages 5088-5092

  Nakano, H ^a   Maetani, K ^a   Hattori, K ^a,b   Daimon, H ^a,b  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Iron silicides; Low energy electron diffraction; Reflection high energy electron diffraction; Scanning tunneling microscopy; Solid phase epitaxy

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; PHASE DIAGRAMS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY;

IRON SILICIDES; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; SCHEMATIC PHASE DIAGRAM; SOLID PHASE EPITAXY;

IRON COMPOUNDS;

EID: 35748953773     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.234     Document Type: Article

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