Si(111)2 × 2-Fe surface reacted with nitric oxide

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 5-9

  Hattori, K ^a   Nishimura, T ^a   Kataoka, K ^a   Shimamoto, Y ^a   Daimon, H ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Auger electron spectroscopy; Chemical reactions; Iron; Nitric oxide; Scanning tunneling microscopy; Silicon

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON DIFFRACTION; IRON; LOW ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE STRUCTURE;

ADATOMS; ATOMIC ARRANGEMENT; NITRIC OXIDE; SURFACE BONDS;

SURFACE REACTIONS;

EID: 4544268832     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.050     Document Type: Article

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