Influence of electrode configuration on dielectric properties of ferroelectric films with interdigital and parallel plate electrodes

Applied Physics Letters

Volumn 91, Issue 18, 2007, Pages

  Liu, Hong ^a   Zhu, Jianguo ^a   Xiao, Dingquan ^a   Gong, Xiaogang ^a   Liang, Jin E ^a   Li, Xuedong ^a   Zhu, Xiaohong ^b  

^a SICHUAN UNIVERSITY   (China)

^b UNITÉ MIXTE DE PHYSIQUE CNRS THALES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; FERROELECTRIC FILMS; LEAD COMPOUNDS; MAGNETRON SPUTTERING; PHOTOLITHOGRAPHY;

ELECTRODE CONFIGURATION; INTERDIGITAL ELECTRODES; PARALLEL PLATE ELECTRODES; RF MAGNETRON;

ELECTRODES;

EID: 35648936422     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2794401     Document Type: Article

References (20)

1. J. F. Scott and C. A. Paz de Araujo, Science 246, 1400 (1989).
2. A. Kingon, Nature (London) 401, 658 (1999).
3. R. Ramesh, A. Inam, W. K. Chan, B. Wilkens, K. Myers, K. Remschnig, D. L. Hart, and J. M. Tarascon, Science 252, 944 (1991).
4. J. F. Scott, Science 315, 954 (2007).
5. A. K. S. Kumar, P. Paruch, J.-M. Triscone, L. Pellegrino, D. Marŕ, and T. Tybell, Appl. Phys. Lett. 85, 1757 (2004).
6. R. W. Babbit, T. E. Koscica, and W. C. Drach, Microwave J. 35, 63 (1992).
7. H. N. Al-Shareef, D. Dimos, M. V. Raymond, R. W. Schwartz, and C. H. Mueller, J. Electroceram. 1, 145 (1997).
8. P. Rundqvist, A. Vorobiev, E. Kollberg, and S. Gevorgian, J. Appl. Phys. 100, 074101 (2006).
9. A. V. Bune, V. M. Fridkin, Stephen Ducharme, L. M. Blinov, S. P. Palto, A. V. Sorokin, S. G. Yudin, and A. Zlatkin, Nature (London) 391, 874 (1998).
10. S. Gevorgiana, A. Vorobiev, and T. Lewin, J. Appl. Phys. 99, 124112 (2006).
11. C. Zinck, D. Pinceau, E. Defa, E. Delevoye, and D. Barbier, Sens. Actuators, A 115, 483 (2004).
12. Y. C. Lee, Y. P. Hong, and K. H. Ko, Appl. Phys. Lett. 90, 182908 (2007).
13. T. Harigai, D. Tanaka, H. Kakemoto, S. Wada, and T. Tsurumi, J. Appl. Phys. 94, 7923 (2003).
14. O. Schneegans, P. Chŕtien, F. Houź, and R. Meyer, Appl. Phys. Lett. 90, 043116 (2007).
15. G. W. Farnell, I. A. Cermak, P. Silvester, and S. K. Wong, IEEE Trans. Sonics Ultrason. 17, 188 (1970).
16. W. Metcalf, Proc. IEE (London) 112, 2033 (1965).
17. H. N. Al-Shareef, D. Dimos, M. V. Raymond, R. W. Schwartz, and C. H. Mueller, J. Electroceram. 1, 145 (1997).
18. S. Zhong, S. P. Alpay, M. W. Cole, E. Ngo, S. Hirsch, and J. D. Demaree, Appl. Phys. Lett. 90, 092901 (2007).
19. C. L. Canedy, Hao Li, S. P. Alpay, L. Salamanca-Riba, A. L. Roytburd, and R. Ramesh, Appl. Phys. Lett. 77, 1695 (2000).
20. D. Balzar, P. A. Ramakrishnan, and A. M. Hermann, Phys. Rev. B 70, 092103 (2004).