Effect of annealing on the Sn-doped TiO 2 films prepared by DC/RF cosputtering

Journal of the Electrochemical Society

Volumn 154, Issue 12, 2007, Pages

  Yao, Hsiao Chiang ^a   Tsia, Tu Cheng ^a   Huang, Chueh Jung ^b   Shieu, Fuh Sheng ^a,c  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b HSIUPING INSTITUTE OF TECHNOLOGY   (Taiwan)

^c ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; FINE GRAIN MICROSTRUCTURES; PHOTOCATALYTIC ACTIVITIES; RADIO FREQUENCY MAGNETRON COSPUTTERING; RUTILE DUPLEX PHASES;

ANNEALING; DOPING (ADDITIVES); MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; THIN FILMS; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

OXIDE FILMS;

EID: 35548979907     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2790283     Document Type: Article

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