메뉴 건너뛰기




Volumn 32, Issue 4, 2003, Pages 205-213

Phenomenological model of the piezoresistive effect in polysilicon films

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL STRUCTURE; DOPING (ADDITIVES); ELASTIC MODULI; ELECTRIC RESISTANCE; GRAIN GROWTH; GRAIN SIZE AND SHAPE; MICROELECTROMECHANICAL DEVICES; OXIDATION; POLYSILICON; STRAIN; STRESSES;

EID: 3543063981     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1024567213980     Document Type: Article
Times cited : (12)

References (20)
  • 1
    • 0026188346 scopus 로고
    • Piezoresistive pressure sensors on polycrystalline silicon
    • Mosser, V., Suski, J., Goss, J.; and Obermeir, E., Piezoresistive Pressure Sensors on Polycrystalline Silicon, Sens. Actuators, A, 1991, vol. 28, pp. 113-132.
    • (1991) Sens. Actuators, A , vol.28 , pp. 113-132
    • Mosser, V.1    Suski, J.2    Goss, J.3    Obermeir, E.4
  • 2
    • 0024664067 scopus 로고
    • Polysilicon SOI pressure sensor
    • Suski, J., Mosser, V., and Goss, J., Polysilicon SOI Pressure Sensor, Sens. Actuators, 1989, vol. 17, pp. 405-414.
    • (1989) Sens. Actuators , vol.17 , pp. 405-414
    • Suski, J.1    Mosser, V.2    Goss, J.3
  • 3
    • 1542429549 scopus 로고
    • The piezoresistive properties of polycrystalline silicon films
    • San Diego, Calif.
    • Suski, J., Mosser, V., and Le Roux, G., The Piezoresistive Properties of Polycrystalline Silicon Films, Electrochem. Soc. Conf., San Diego, Calif., 1986, p. 331.
    • (1986) Electrochem. Soc. Conf. , pp. 331
    • Suski, J.1    Mosser, V.2    Le Roux, G.3
  • 4
    • 3543083084 scopus 로고
    • PhD Thesis, University of Munich
    • Obermeir, E., PhD Thesis, University of Munich, 1983.
    • (1983)
    • Obermeir, E.1
  • 5
    • 0022064762 scopus 로고
    • Polycrystalline silicon strain sensors
    • French, P.H. and Evans, A.G.R., Polycrystalline Silicon Strain Sensors, Sens. Actuators, 1985, vol. 7, pp. 135-142.
    • (1985) Sens. Actuators , vol.7 , pp. 135-142
    • French, P.H.1    Evans, A.G.R.2
  • 6
    • 0023313692 scopus 로고
    • Piezoresistive properties of polycrystalline and crystalline silicon films
    • Schubert, D., Jenschke, W., Uhlig, T., and Schmidt, F.M., Piezoresistive Properties of Polycrystalline and Crystalline Silicon Films, Sens. Actuators, 1987, vol. 11, pp. 145-155.
    • (1987) Sens. Actuators , vol.11 , pp. 145-155
    • Schubert, D.1    Jenschke, W.2    Uhlig, T.3    Schmidt, F.M.4
  • 8
    • 0021523149 scopus 로고
    • Piezoresistance in polysilicon
    • French, P.H. and Evans, A.G.R., Piezoresistance in Polysilicon, Electron. Lett., 1984, vol. 24, pp. 999-1000.
    • (1984) Electron. Lett. , vol.24 , pp. 999-1000
    • French, P.H.1    Evans, A.G.R.2
  • 9
    • 0034355802 scopus 로고    scopus 로고
    • Isotropic piezoresistance in polycrystalline silicon for in-plane shear- And normal-stress gauges
    • Toriyama, T., Yokoyama, Y., and Sugiyama, S., Isotropic Piezoresistance in Polycrystalline Silicon for In-Plane Shear- and Normal-Stress Gauges, Sens. Mater., 2000, vol. 12, pp. 473-490.
    • (2000) Sens. Mater. , vol.12 , pp. 473-490
    • Toriyama, T.1    Yokoyama, Y.2    Sugiyama, S.3
  • 10
    • 0024481433 scopus 로고
    • Piezoresistance in polysilicon and its application to strain gauges
    • French, P.H. and Evans, A.G.R., Piezoresistance in Polysilicon and Its Application to Strain Gauges, Solid-State Electron., 1989, vol. 32, pp. 1-10.
    • (1989) Solid-state Electron. , vol.32 , pp. 1-10
    • French, P.H.1    Evans, A.G.R.2
  • 12
    • 0031176765 scopus 로고    scopus 로고
    • Calibration procedure for piezoresistance coefficients of polysilicon sheets and application to a stress test chip
    • Bossche, A. and Mollinger, J.R., Calibration Procedure for Piezoresistance Coefficients of Polysilicon Sheets and Application to a Stress Test Chip, Sens. Actuators, A, 1997, vol. 62, pp. 475-479.
    • (1997) Sens. Actuators, A , vol.62 , pp. 475-479
    • Bossche, A.1    Mollinger, J.R.2
  • 13
    • 0001424223 scopus 로고
    • Polycrystalline Si under strain: Elastic and lattice-dynamical considerations
    • Anastassakis, E. and Liarokapis, E., Polycrystalline Si under Strain: Elastic and Lattice-Dynamical Considerations, J. Appl. Phys., 1987, vol. 62, pp. 3346-3352.
    • (1987) J. Appl. Phys. , vol.62 , pp. 3346-3352
    • Anastassakis, E.1    Liarokapis, E.2
  • 14
    • 33144479510 scopus 로고
    • The elastic behaviour of a crystalline aggregate
    • Hill, R., The Elastic Behaviour of a Crystalline Aggregate, Proc. Phys. Soc., A, 1957, vol. 65, pp. 349-354.
    • (1957) Proc. Phys. Soc., A , vol.65 , pp. 349-354
    • Hill, R.1
  • 16
    • 0033297078 scopus 로고    scopus 로고
    • Measurement of Mechanical for MEMS Materials
    • Yi, Y. and Kim, C.-J., Measurement of Mechanical for MEMS Materials, Meas. Sci. Technol., 1999, vol. 10, pp. 706-716.
    • (1999) Meas. Sci. Technol. , vol.10 , pp. 706-716
    • Yi, Y.1    Kim, C.-J.2
  • 19
    • 0019392851 scopus 로고
    • Modeling and optimization of monolithic polycrystalline silicon resistors
    • Lu, N.C.C., Gerzberg, L., Lu, C.Y., and Meindl, J.D., Modeling and Optimization of Monolithic Polycrystalline Silicon Resistors, IEEE Trans. Electron Devices, 1981, vol. 28, pp. 818-830.
    • (1981) IEEE Trans. Electron Devices , vol.28 , pp. 818-830
    • Lu, N.C.C.1    Gerzberg, L.2    Lu, C.Y.3    Meindl, J.D.4
  • 20
    • 0021408209 scopus 로고
    • Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system - Part 1 : Small signal theory
    • Kim, D.M., Khondker, A.N., Ahmed, S.S., and Shah, R.R., Theory of Conduction in Polysilicon: Drift-Diffusion Approach in Crystalline-Amorphous- Crystalline Semiconductor System - Part 1 : Small Signal Theory, IEEE Trans. Electron Devices, 1984, vol. 31, pp. 480-493.
    • (1984) IEEE Trans. Electron Devices , vol.31 , pp. 480-493
    • Kim, D.M.1    Khondker, A.N.2    Ahmed, S.S.3    Shah, R.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.