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Volumn 4, Issue 3, 2007, Pages 105-111

High-temperature spin-on adhesives for temporary wafer bonding

Author keywords

Spin on adhesives; Temporary adhesives; Temporary wafer bonding; Wafer thinning

Indexed keywords

DEPOSITION; ELECTRONICS PACKAGING; WAFER BONDING;

EID: 35348959399     PISSN: 15514897     EISSN: None     Source Type: Journal    
DOI: 10.4071/1551-4897-4.3.105     Document Type: Article
Times cited : (9)

References (5)
  • 2
    • 85039080781 scopus 로고    scopus 로고
    • J. Moore, A. Smith, D. Nguyen, and S. Kulkarni, High Temperature Resistant Adhesive for Wafer Thinning and Backside Processing, MANTECH 2004, p. 8.10.
    • J. Moore, A. Smith, D. Nguyen, and S. Kulkarni, "High Temperature Resistant Adhesive for Wafer Thinning and Backside Processing," MANTECH 2004, p. 8.10.
  • 3
    • 34250889635 scopus 로고    scopus 로고
    • Advances in Processing of Compound Semiconductor Substrates
    • C. Brubaker, M. Wimplinger, A. Malzer, and P. Lindner, "Advances in Processing of Compound Semiconductor Substrates," MANTECH 2005, p. 261.
    • (2005) MANTECH , pp. 261
    • Brubaker, C.1    Wimplinger, M.2    Malzer, A.3    Lindner, P.4
  • 4
    • 34250794739 scopus 로고    scopus 로고
    • Reversible Wafer Bonding: Challenges in Ramping up 150mm GaAs Wafer Production to Meet Growing Demand
    • S. Combe, J. Cullen, and M. O'Keefe. "Reversible Wafer Bonding: Challenges in Ramping up 150mm GaAs Wafer Production to Meet Growing Demand," MANTECH 2006, p. 193.
    • (2006) MANTECH , pp. 193
    • Combe, S.1    Cullen, J.2    O'Keefe, M.3
  • 5
    • 23944470605 scopus 로고    scopus 로고
    • An Evaluation Process of Polymeric Adhesive Wafer Bonding for Vertical System Integration
    • Japanese Journal of Applied Physics, Part 1
    • Y. Kwon and J. Seok, "An Evaluation Process of Polymeric Adhesive Wafer Bonding for Vertical System Integration," Japanese Journal of Applied Physics, Part 1, Vol. 44, No. 6A, pp. 3893-3902, 2005.
    • (2005) , vol.44 , Issue.6 A , pp. 3893-3902
    • Kwon, Y.1    Seok, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.