Ion-shading effects during metal etch in plasma processing

IEEE Transactions on Plasma Science

Volumn 35, Issue 5 I, 2007, Pages 1388-1396

  Madziwa Nussinov, Tsitsi G ^a   Arnush, Donald ^b   Chen, Francis F ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b University of California   (United States)

Author keywords

Electron shading damage; Ion shading; Ion trajectories; Metal etch; Plasma processing

Indexed keywords

DEFORMATION; ELECTRIC FIELD MEASUREMENT; ELECTRONS; IONS; PHOTORESISTS;

ELECTRON-SHADING DAMAGE; ION SHADING; METAL ETCH; THERMAL ELECTRON;

PLASMA ETCHING;

EID: 35348901343     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.905203     Document Type: Article

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