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Volumn 35, Issue 5 I, 2007, Pages 1370-1378

Generation of fast neutral beams by ion neutralization in high-aspect-ratio holes: A particle-in-cell simulation study

Author keywords

Charge free semiconductor manufacturing; Energetic neutral beams; Neutral beam sources; Particle in cell (PIC); Plasma processing; Simulation

Indexed keywords

ANGULAR DISTRIBUTION; ASPECT RATIO; COMPUTER SIMULATION; MICROELECTRONICS; PLASMA APPLICATIONS;

EID: 35348874310     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.906439     Document Type: Article
Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.