Hp45 lithography in consideration of the mask 3D effect

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Sato, Kazuya ^a   Itoh, Masamitsu ^a   Sato, Takashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Attenuated PSM; Dose MEF; EMF simulation; Mask bias; Transmittance

Indexed keywords

APPROXIMATION THEORY; LIGHT REFLECTION; LITHOGRAPHY; OPTIMIZATION; PATTERN RECOGNITION;

ATTENUATED PHASE SHIFT MASK (ATT-PSM); EMF SIMULATION; MASK BIAS; TRANSMITTANCE;

MASKS;

EID: 33748068469     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681882     Document Type: Conference Paper

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