The characterization of photoresist for accurate simulation beyond Gaussian diffusion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Wang, Lei ^a   Wu, Peng ^a   Wu, Qiang ^a   Ding, Hua ^a   Li, Xin ^a   Sun, Changjiang ^a  

^a Shanghai Huahong NEC Electronics Company Ltd   (China)

Author keywords

Chemical amplification; Gaussian diffusion; Optical proximity correction; Resist model

Indexed keywords

ALGORITHMS; AMPLIFICATION; COMPUTER SIMULATION; DIFFUSION; IMAGE PROCESSING; INTEGRATED CIRCUITS;

CHEMICAL AMPLIFICATION; GAUSSIAN DIFFUSION; OPTICAL PROXIMITY CORRECTION; RESIST MODEL;

PHOTORESISTS;

EID: 35148875195     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712511     Document Type: Conference Paper

References (5)

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