Pulsed electrodeposition of cobalt and nickel alloy

Transactions of the Institute of Metal Finishing

Volumn 85, Issue 5, 2007, Pages 274-280

  Subramanian, M ^a   Dhanikaivelu, N ^a   Rama Prabha, R ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

Corrosion resistance; Current efficiency; Hardness; Off time; On time

Indexed keywords

CORROSION RESISTANCE; CURRENT DENSITY; ELECTRODEPOSITION; HARDNESS; THICKNESS MEASUREMENT;

CURRENT EFFICIENCY; DUTY CYCLE; PULSE CURRENT DENSITY; PULSED ELECTRODEPOSITION;

BINARY ALLOYS;

EID: 35148873489     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1179/174591907X229644     Document Type: Article

References (37)

1. F. Prasal: US patent 3 274 079, 1966; Chem. Abstr., 1967, 66, 16032k.
2. F. Friemel: East German patent 52 869, 1966; Chem. Abstr., 1967, 67, 17376h.
3. M. Jato; Jpn patent 74 33723, 1974; Chem. Abstr., 1975, 82, 91774n.
4. S. Ichioka and T. Koda: Jpn patent 75 02377, 1975; Chem. Abstr., 1975, 83, 87387s.
5. V. B. Singh and V. N Singh: Plat. Surf. Finish., 1976, 63, (7), 34.
6. C. C. Hu and C. Y. Weng: J. Appl. Electrochem., 2000, 31, 499.
7. C. C. Hu and A. Bai: J. Appl. Electrochem., 2001, 31, 565.
8. F. Maurel, B. Knosp and M. Backhaus-Ricoult: J. Electrochem. Soc., 2000, 147, 78.
9. C. C., Wang, K. S. Goto and S. A. Akbar; J. Electrochem. Soc., 1991, 138, 3673.
10. W. Schwarzacher and D. S. Lashmore: IEEE Trans. Magn., 1996, 32, 3133.
11. S. S. Djokic and M. D. Maksimovic: in 'Modern aspects of electrochemistry', (ed. J. O'M Bockris), No. 22, 417; 1992, New York, Plenum Press.
12. T. Osaka: Electrochem. Acta, 1999, 44, 3855.
13. T. Osaka, M. Takai, K. Ohashi, M. Saito and K. Yamada: Nature, 1998, 392, 796.
14. E. M. Kakuno, D. H. Mosca, I. Mazzaro, N. Mattoso, W. H. Schreiner, M. A. B. Gomes and M. P. Cantao; J. Electrochem. Soc., 1997, 144, 3222.
15. K. M. Yin: J. Electrochem. Soc., 1997, 144, 1560.
16. E. Beltowska-Lenman and A. Riesenkampf: Surf. Technol., 1980, 11, 349.
17. Y. M. F. Marikar and K. I. Vasu: Chem. Era, 1970, 6, 5.
18. G. Sotirova, I. Petrova and S. Amryanov: Galvanotech. Sym., 1985, 7, 382.
19. S. I. Berezian. R. M. Sageeva, L. G. Sharapova and V. G. Shtyrlin: Zashch. Met., 1986, 22, 267.
20. J. Scoyer and R. Winand: Surf. Technol., 1977, 5, 169.
21. T. Shimada; Jpn patent 62 19979, 1987.
22. Y. Y. Wang, C. S. Tung and C. C. Wan: Met. Finish., 1980, 78, (9), 21.
23. C. A. Snavely: Trans. Electrochem. Soc., 1947, 92, 537.
24. N. Ibl: Surf. Technol., 1980, 10, 81.
25. C. J. Raub and A. Knodler; Plat. Surf. Finish., 1978, 65, (9), 32.
26. N. M. Osero: Plat. Surf. Finish., 1986, 73, (3), 20.
27. N. Masuko, T. Osaka and Y. Ito (eds.): 'New trends and approaches in electrochemical technology'; 1996, New York, John Wiley & Sons.
28. S. I. Kwak, K. M. Jeong, S. J. Kim and H. J. Sohn: J. Electrochem. Soc., 1996, 143, 2770.
29. N. Ibl: Surf. Technol., 1980, 10, 81-104.
30. D. T. Chin: J. Electrochem. Soc., 1983, 130, 1657.
31. M. Datta and D. Landolt: Surf. Technol., 1985, 25, 97.
32. H. Y. Cheh: J. Electrochem. Soc., 1971, 118, 551.
33. M. Halmdienst, W. E. G. Hansal, G. Kaltenhauser and W. Kautek: Trans. IMF, 2007, 85, (1), 22.
34. C. Suarez, E. Chavez, J. A. Diez, H. Grande and R. Guixa: Trans. IMF, 2007, 85, (1), 46.
35. G. Devaraj: Plat. Surf. Finish., 1996, 83, (6), 62.
36. J. C. Puippe and F. Leaman (eds.); 'Theory and practice of pulse plating', 1st edn, 1-247; 1986, Orlando, FL, AESF.
37. B. Subramanian, S. Mohan and S. Jayakrishnan: Surf. Coat. Technol, 2006, 201, 1145.