Advanced edge roughness measurement application for mask metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Marschner, Thomas ^a   Richter, Jan ^a   Dersch, Uwe ^a   Moran, Amit ^b   Katz, Ruthy ^b   Chase, David ^b   Falah, Reuven ^b   Coleman, Thomas ^b  

^a Advanced Mask Technology Center   (Germany)

^b Applied Materials Inc Israel   (Israel)

Author keywords

CD SEM metrology; LER; LWR; Mask metrology

Indexed keywords

ALGORITHMS; MASKS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

CD-SEM METROLOGY; CRITICAL DIMENSIONS (CD); LER TEST MASK; LINE EDGE ROUGHNESS (LER); LINE-WIDTH ROUGHNESS (LWR);

MEASUREMENT THEORY;

EID: 35148867713     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712530     Document Type: Conference Paper

References (5)

1. T.Marschner, A.Lee, S.Fuchs, L.Völkel, C.Stief, 193nm Resist Roughness Characterization and Process Propagation Investigation Using a CD-SEM, SPIE Microlithography Conference 2004, Proc. SPIE 5375, p.477 (2004).
2. D.Chase, R.Kris, R.Katz, A.Tam, L.Gershtein, R, Falah, N.Wertsman, Advanced Edge Roughness Measurement Application for Mask Metrology, BACUS 2005, Proc. SPIE 5992, p.59924N (2005)
3. T.Heins, U.Dersch, R.Liebe, J.Richter, Line Edge Roughness on Photo Lithographic Masks, SPIE Microlithography Conference 2006, Proc. SPIE 6152, p.61521O-1 (2006).
4. J.S.Villarubia, B.Bunday, Unbiased Estimation of Linewidth Roughness, SPIE Microlithography Conference 2004, Proc. SPIE 5752, p.840 (2004).
5. R.Katz, D.Chase, R.Kris, R.Peltinov, J.Villarubia, B.Bunday, Bias reduction in roughness measurement through SEM noise removal, SPIE Microlithography Conference 2006, Proc. SPIE 6152, p.61524L-1 (2006).