Contamination and particle control system in immersion exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Kobayashi, Masamichi ^a   Nakano, Hitoshi ^a   Arakawa, Mikio ^a   Tanabe, Masayuki ^a   Toyoda, Koji ^a   Chibana, Takahito ^a   Matsuoka, Yoichi ^a   Kawasaki, Youji ^a  

^a CANON INC   (Japan)

Author keywords

193 nm immersion lithography; Cleaning; Contamination; Defect; Particle

Indexed keywords

CLEANING; DENSITY (OPTICAL); LENSES; LITHOGRAPHY; PROCESS CONTROL; WAFER BONDING;

CANON IMMERSIONS; DEVELOPER SOLUBLE TOPCOATS; IMMERSION EXPOSURE TOOLS; PARTICLE CONTROL SYSTEMS;

CONTROL SYSTEMS;

EID: 35148814022     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711289     Document Type: Conference Paper

References (7)

1. B. J. Lin, Proc. SPIE 4688, 11(2002)
2. T. Honda et al., Proc. SPIE 5377, 319(2004)
3. J. H. Burnett and S. Kaplan, Proc. SPIE 5040, 1742(2003)
4. H. Nakano et al., Proc. SPIE 5754, 693(2005)
5. H. Nakano, SEMI Technology Symposium, p4-76 (2004)
6. T. Chibana et al., Proc. SPIE 6154-68(2006)
7. M. Kobayashi, SEMI Technology Symposium, p6-22 (2006)