Observing morphology on surface of poly(methacrylate) in ArF lithography using AFM phase image

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Matsunaga, Shuji ^a   Aratani, Ichihiro ^a   Okabe, Fumihiko ^a   Kitayama, Masahiko ^a  

^a KURARAY CO LTD   (Japan)

Author keywords

ArF; Atomic force microscope (AFM); End group; Fluctuation; Line edge roughness (LER); Morphology; Phase image

Indexed keywords

ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; MORPHOLOGY; POLYMERS; PROBLEM SOLVING;

END GROUP; FLUCTUATION; LINE EDGE ROUGHNESS; PHASE IMAGE;

SURFACE ROUGHNESS;

EID: 35148849179     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711392     Document Type: Conference Paper

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