Advanced resist design using AFM analysis for ArF lithography

Journal of Photopolymer Science and Technology

Volumn 16, Issue 3, 2003, Pages 467-473

  Kubota, Naotaka ^a   Hayashi, Tomohiko ^a   Iwai, Takeshi ^a   Komano, Hiroshi ^a   Kawai, Akira ^b  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

ArF; Atomic force microscope (AFM); Line edge roughness (LER); Lithography; Polymer aggregate; Resist; Surface roughness

Indexed keywords

POLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CORRELATION ANALYSIS; DISSOLUTION; LITHOGRAPHY; POLYMERIZATION; PROCESS TECHNOLOGY; QUANTITATIVE ANALYSIS; SURFACE PROPERTY;

EID: 0038506917     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.467     Document Type: Article

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