Polarization aberrations in hyper-numerical-aperture projection printing: A comparison of various representations

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 3, 2006, Pages

  McIntyre, Gregory R ^a,b   Kye, Jongwook ^b   Levinson, Harry ^b   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Jones pupil; Mueller pupil; Optical lithography; Pauli pupil; Polarization aberrations

Indexed keywords

MUELLER MATRIX; NUMERICAL APERTURE TOOLS; PAULI PUPIL; POLARIZATION ABERRATIONS; PROJECTION PRINTING; WAVEFRONT DISTORTIONS;

ABERRATIONS; NUMERICAL ANALYSIS; PHOTOLITHOGRAPHY; POLARIZATION; WAVE EQUATIONS; WAVEFRONTS;

PROJECTION SYSTEMS;

EID: 33845431171     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2358129     Document Type: Article

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