Photolithography using the aerial™ illuminator in a variable NA wafer stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 54-70

  Rogoff, Richard ^a   Davies, Guy ^a   Mulkens, Jan ^a   De Klerk, Jos ^a   Van Oorschot, Peter ^a   Kalmbach, Gabrielle ^a   Wangler, Johannes ^a   Rupp, Wolfgang ^a   Zeiss, Carl ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSING; MASKS; OPTICAL INSTRUMENT LENSES; PHASE SHIFT; PROJECTION SYSTEMS;

AERIAL ILLUMINATORS; PHASE SHIFT MASKS;

PHOTOLITHOGRAPHY;

EID: 0030316302     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240954     Document Type: Conference Paper

References (10)

1. High throughput wafer steppers with automatically adjustable conventional and annular illumination modes
2. Optical lithography: Present status and contamination below 0.25 μm
3. I-line lithography for sub half micron design rules
4. CD - Control issues for sub 0.25 μm processes
5. A novel inorganic arc for sub 0.4 micron optical lithography
6. Intra-chip linewidth variation for 0.5 micron poly gates
7. Computer simulations for sub 0.35 μm novolak resists
8. 0.35 μm lithography using off axis illumination
9. Subquarter micron optical lithography with practical super resolution technique
10. 0.30 μm and Sub 0.30 μm i-line lithography for random logic poly gates