New mask blank handling system for the advanced electron beam writer, the EX-11

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 436-445

  Yoshitake, Shusuke ^a   Ooki, Kenji ^a   Ogawa, Yoji ^a   Ogura, Katsuhito ^a   Yamamoto, Teruaki ^a   Hirano, Ryoichi ^a   Toriumi, Masaki ^a   Tojo, Tom ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CONTAMINATION; MASKS; PARTICLES (PARTICULATE MATTER);

ADVANCED ELECTRON BEAM WRITER; STANDARD MECHANICAL INTERFACES (SMIF);

ELECTRON BEAM LITHOGRAPHY;

EID: 0032684805     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360222     Document Type: Conference Paper

References (3)