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Electroanalysis

Volumn 17, Issue 2, 2005, Pages 120-126

A role of the plating regime in the deposition of bismuth films onto a carbon paste electrode. Microscopic study

(5) Svancara, Ivan a Baldrianova, Lucie a Vlcek, Milan a Metelka, Radovan a Vytras, Karel a

a UNIVERSITY OF PARDUBICE (Czech Republic)

Author keywords

Bismuth film plated carbon paste electrode; Plating regime; Scanning electron microscopy; Surface characteristics

Indexed keywords

BISMUTH COMPOUNDS; BROMINE COMPOUNDS; CARBON; CARBON FILMS; CHLORINE COMPOUNDS; ELECTRODES; PLATES (STRUCTURAL COMPONENTS); PLATING; POTASSIUM COMPOUNDS; STRUCTURE (COMPOSITION);

A-CARBON; ACETATE BUFFERS; BISMUTH FILM; BISMUTH FILM-PLATED CARBON PASTE ELECTRODE; CARBON PASTE ELECTRODE; EXPERIMENTAL CONDITIONS; MICROSCOPIC STUDY; PLATING REGIME; PLATING SOLUTIONS; SURFACE CHARACTERISTICS;

SCANNING ELECTRON MICROSCOPY;

EID: 20444493887 PISSN: 10400397 EISSN: None Source Type: Journal
DOI: 10.1002/elan.200403061 Document Type: Review

Times cited : (44)

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