Aluminum diffusion and reaction in thin films of perylene-3,4,9,10- tetracarboxylic dianhydride: Depth profiles and time-dependent diffusion coefficients

Applied Physics Letters

Volumn 91, Issue 14, 2007, Pages

  Yoshida, Hiroyuki ^a   Sato, Naoki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METAL DIFFUSION; PERYLENE;

ALUMINUM; DEPOSITION; DIFFUSION; ORGANIC COMPOUNDS; VACUUM DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 34948817829     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2763980     Document Type: Article

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