Understanding the switching-off mechanism in Ag+ migration based resistively switching model systems

Applied Physics Letters

Volumn 91, Issue 13, 2007, Pages

  Guo, Xin ^a   Schindler, Christina ^c   Menzel, Stephan ^b   Waser, Rainer ^a,b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

DEIONIZED WATER; DISSOLUTION; ELECTROMIGRATION; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER COMPOUNDS;

BIPOLAR SWITCHING; PTAG STRUCTURES; SWITCHING-OFF MECHANISM;

SWITCHING;

EID: 34848899459     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2793686     Document Type: Article

References (20)

1. R. Dong, D. S. Lee, W. F. Xiang, S. J. Oh, D. J. Seong, S. H. Heo, H. J. Choi, M. J. Kwon, S. N. Seo, M. B. Pyun, M. Hasan, and H. Hwang, Appl. Phys. Lett. 90, 042107 (2007).
2. J.-W. Park, J.-W. Park, D.-Y. Kim, and J.-K. Lee, J. Vac. Sci. Technol. A 23, 1309 (2005).
3. Y.-H. You, B. S. So, J.-H. Hwang, W. Cho, S. S. Lee, T.-M. Chung, C. G. Kim, and K.-S. An, Appl. Phys. Lett. 89, 222105 (2006).
4. D. S. Jeong, H. Schroeder, and R. Waser, Appl. Phys. Lett. 89, 082909 (2006).
5. M. Fujimoto, H. Koyama, M. Konagai, Y. Hosoi, K. Ishihara, S. Ohnishi, and N. Awaya, Appl. Phys. Lett. 89, 223509 (2006).
6. B. J. Choi, S. Choi, K. M. Kim, Y. C. Shin, C. S. Hwang, S.-Y. Hwang, S.-S. Cho, S. Park, and S.-K. Hong, Appl. Phys. Lett. 89, 012906 (2006).
7. S. Karg, G. I. Meijer, D. Widmer, and J. G. Bednorz, Appl. Phys. Lett. 89, 072106 (2006).
8. Y. Watanabe, J. G. Bednorz, A. Bietsch, Ch. Gerber, D. Widmer, A. Beck, and S. J. Wind, Appl. Phys. Lett. 78, 3738 (2001).
9. K. Szot, W. Speier, G. Bihlmayer, and R. Waser, Nat. Mater. 5, 312 (2006).
10. M. P. Singh, L. Mechin, W. Prellier, and M. Maglione, Appl. Phys. Lett. 89, 202906 (2006).
11. R. Oligschlaeger, R. Waser, R. Meyer, S. Karthäuser, and R. Dittmann, Appl. Phys. Lett. 88, 042901 (2006).
12. A. Beck, J. G. Bednorz, Ch. Gerber, C. Rossel, and D. Widmer, Appl. Phys. Lett. 77, 139 (2000).
13. X. Chen, N. Wu, J. Strozier, and A. Ignatiev, Appl. Phys. Lett. 89, 063507 (2006).
14. A. Baikalov, Y. Q. Wang, B. Shen, B. Lorenz, S. Tsui, Y. Y. Sun, Y. Y. Xue, and C. W. Chu, Appl. Phys. Lett. 83, 957 (2003).
15. S. Tsui, A. Baikalov, J. Cmaidalka, Y. Y. Sun, Y. Q. Wang, Y. Y. Xue, C. W. Chu, L. Chen, and A. J. Jacobson, Appl. Phys. Lett. 85, 317 (2004).
16. M. Fujimoto, H. Koyama, S. Kobayashi, Y. Tamai, N. Awaya, Y. Nishi, and T. Suzuki, Appl. Phys. Lett. 89, 243504 (2006).
17. M. N. Kozicki, IEEE Trans. Nanotechnol. 4, 331 (2005).
18. M. Mitkova and M. N. Kozicki, J. Non-Cryst. Solids 299-302, 1023 (2002).
19. K. Terabe, T. Hasegawa, T. Nakayama, and M. Aono, Nature (London) 433, 47 (2005).
20. S. Kaeriyama, T. Sakamoto, H. Sunamura, M. Mizuno, H. Kawaura, T. Hasegawa, K. Terabe, T. Nakayama, and M. Aono, IEEE J. Solid-State Circuits 40, 168 (2005).